Semiconductor and chip fabrication plants need to use the highest quality water (called Ultrapure Water or UPW), to produce everything from microchips, to LEDs, smart phones, flat panel monitors, and silicon wafers and more.
Ultrapure Water (also known as highly purified water or HPW), is water that is free from impurities and contaminants such as microbes, minerals and bacteria. It is produced under stringent specifications and guidelines.
A large fabrication plant can easily use upwards of 10 million gallons of Ultrapure Water every day in fab processes such as water polishing, clean rinse, dicing and back grinding and of course Ultrapure Water production.
Water conservation, recycling and water reuse
Quality defects due to rinse fouling
Chemical reduction
Energy and operational cost savings
Contaminant removal (related to toxic materials and chemicals in the wastewater discharge)
Maintain compliance regulations – specifically around Total Organic Carbon (TOC) and silica
Let Hach® be your water partner. With our online and lab solutions with real-time process control, we can help you ensure the high standard of Ultrapure Water quality you require, optimize component usage, maximize the effectiveness of your watercycle, boost operational efficiency, reduce equipment downtime and more.
From source water, to wastewater monitoring and analysis, to Ultrapure Water, you can depend on Hach.
Electronic component manufacturing unit: main components in Ultrapure Water and industrial wastewater recycling systems
Mains Water
Ultrapure Water Production
Recycling System
Ultrapure Water Loop
Rinsing Water
Chemical Mechanical Planarization
Fabrication
Wastewater Treatment
Discharge
Organic Industrial Wastewater
Pretreated Recycled Water
Pretreatment | |||||||||||
Raw Water Tank | Media-filter MMF ACF | Deionization (Optional) | Reverse Osmosis (Double Pass Common) | Make-up Plant | |||||||
Primary | |||||||||||
Ion Exchange | UV Treatment (185 nm) | Degasifier (Optional) | Permeate Tank | ||||||||
Ultrapure Water Tank (Ozonation Optional) | UV Treatment (185 nm) | Hexagonal boron nitride, h-BN | Degas (Tower or Membrane) | Polish Plant | |||||||
Fabrication | Point of Use Filters | Final Filters | Polish Mixed Bed |
Reduce Fresh Water Consumption
Reduce Discharge Volume
Reduce Electricity Usage
Reduce Fuel Consumption
Reduce Operational Cost
Improve Productivity
Reduce Compliance Risk
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